The LEP
Series of standard specification can automatically measure
edge shape, wafer diameter, orientation flat length (in case
of double orientation flat, orientation flat angle) and V-notch
shape.
In
the LEP Series, sub-pixel detection method (measuring length
in stricter precision than element sizes of the CCD image
sensor and linear sensor) is applied for improving measurement
resolution.
By
processing light intensity received by each element by computer,
resolution as high as 1/16 (approx. 0.6um)
of element size is achieved.
Edges
with different shapes can be treated by option software. |