measurement services by contract using our unique measurement systems is possible.
Lifetime measurment for Semiconductor materials such as Si,SiC, GaN, LTPS, and IGZO
Litetime mapping example of bulk wafer
Lifetime measurement for semiconductor materials such asn Si, SiC, GaN, LTPS, and IGZO. By measuring the lifetime, the heavy metal mixture of a wafers, the integrity of the crystals can be measured and also the wafer pollution cause may be detected.
Standard Spec. pitch measurement of our Lifetime equipment is 0.5mm and with it high speed small mapping is possible.
Blue figure represents short lifetime.
Flatness: Si, SiC Sapphire substrate(Bow, Warp, TTV, GBIR, FSQR, and etc) flatness measurement.
Measurement Example
Makyo: Si Substrate(Mirror) surface observation
Si Wafer surface observation example
Surface Roughness, Projection, Dent, Grinding Masks , Edge Crack, and Thermal Slip appears clearly
Edge Profile: Si, SiC, Sapphire Substrate edge(bevel) profile measurement.
Edge/Notch profile mearement example
shows the measurement example of edge/notch profile.
different profiles canbe supported using optional software.
Edge Roll Off (ROA: Roll Off Amount) can be measured without any contact/distruction front/back at the same tme.
Edge Roll Off mearement example